Lock release lithography for 3D and composite microparticles

Lab Chip. 2009 Apr 7;9(7):863-6. doi: 10.1039/b821930c. Epub 2009 Feb 13.

Abstract

We present a method called "Lock Release Lithography (LRL)" that utilizes a combination of channel topography, mask design, and pressure-induced channel deformation to form and release particles in a cycled fashion. This technique provides a means for the high-throughput production of particles with complex 3D morphologies and composite particles with spatially configurable chemistries. In this work, we demonstrate a diverse set of functional particles including those displaying heterogeneous swelling characteristics and containing functional entities such as nucleic acids, proteins and beads.

Publication types

  • Research Support, Non-U.S. Gov't
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Atmospheric Pressure
  • Dimethylpolysiloxanes / chemistry
  • Elasticity
  • Fluorescent Dyes / chemistry
  • Imaging, Three-Dimensional
  • Microchemistry / methods*
  • Nanostructures / ultrastructure*
  • Nanotechnology / methods*
  • Particle Size
  • Polyethylene Glycols / chemistry
  • Rhodamines / chemistry

Substances

  • Dimethylpolysiloxanes
  • Fluorescent Dyes
  • Rhodamines
  • poly(ethylene glycol)diacrylate
  • Polyethylene Glycols
  • baysilon